Atomic Layer Deposition of MoS ₂ Decorated TiO ₂ Nanotubes for Photoelectrochemical Water Splitting

Atomic Layer Deposition of TiO

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Electrocatalyst decorated hematite nanowire arrays for photoelectrochemical water splitting

Tantalum nitride films integrated with transparent conductive oxide substrates via atomic layer deposition for photoelectrochemical water splitting.

Tantalum nitride, Ta3N5, is one of the most promising materials for solar energy driven water oxidation. One significant challenge of this material is the high temperature and long duration of ammonolysis previously required to synthesize it, which has so far prevented the use of transparent conductive oxide (TCO) substrates to be used which would allow sub-bandgap light to be transmitted to a ...

Atomic layer deposition of ZnS nanotubes.

We report on the growth of high-aspect-ratio (approximately > 300) zinc sulfide nanotubes with variable, precisely tunable, wall thicknesses and tube diameters into highly ordered pores of anodic alumina templates by atomic layer deposition (ALD) at temperatures as low as 75 degrees C. Various characterization techniques are employed to gain information on the composition, morphology and crysta...

Atomic layer deposition of platinum catalysts on nanowire surfaces for photoelectrochemical water reduction.

The photocathodic hydrogen evolution reaction (HER) from p-type Si nanowire (NW) arrays was evaluated using platinum deposited by atomic layer deposition (ALD) as a HER cocatalyst. ALD of Pt on the NW surface led to a highly conformal coating of nanoparticles with sizes ranging from 0.5 to 3 nm, allowing for precise control of the Pt loading in deep submonolayer quantities. The catalytic perfor...